V. TREFILOV, et
al
Torsion Field Devices
Crystalline rechargeable battery :
850-1040 Watt-Hours/Kg, & Thermoelectric Capacitor Cooling
Device
David YURTH : “Seeing Past The
Edge”
[ Excerpt ]
At the Institute for Problems of Materials Science located in
Kiev, Republic of Ukraine, a scientific team led by Academicians
Trefilov, Tovschuk [ Tovstjuk ] and Kovalyuk created a solid-state
energy cell which produces 850-1040 watt-hours/kilogram, in
laboratory prototypes. This is at least 35-50 times the energy
density of any known conventional energy storage devices
developed in the West. The reliability of their claims regarding
this technology has been verified by INEEL, DARPA and the AMTL. A
key element of their crystalline lattice deposition method relies
on the effects of a torsion field beam. Scientists working at
Sandia Laboratories in Los Alamos, New Mexico, have reported the
successful development of a thin-film solid-state energy storage
device which reportedly demonstrates energy density in the range
of 250-400 watt-hours/kilogram.
xxvi -- David Yurth, The Anthropos Files, loc. cit. IPMS
has also perfected the use of a specially modulated torsion field
device to manufacture mono-molecular powders of strategic metals.
Using this revolutionary manufacturing method, metals can be
stored in conventional glass containers without involuntarily
generating static electricity...
...In 1992, I watched a demonstration conducted by two technicians
from IPMS in the board room of the law firm of O'Melveny and
Meiers in Newport Beach, California. They attached a piece of flat
black material to a small clip suspended from a conventional
chemistry lab test tube stand [single metal pole extending
vertically from a cast iron base]. To the corners of this material
they attached the leads from a conventional 9-volt battery, using
small alligator clips, one attached at each corner. Within 20
seconds, the top surface of the tarot-card sized flat black card
became covered with a layer of ice crystals. Within 30 seconds, a
continuous cloud of frozen ice crystals [looking for all the world
like the vapor which rolls out of a bucket of water when a piece
of dry ice is dropped into it] began to pour off the upper surface
of the suspended card and onto the top of the 20-foot long board
room table. Within a minute, the cloud entirely covered the board
table and was pouring off the edge of the table onto the laps of
the people who were seated around the table watching this
demonstration.
When the technician offered to allow someone to actually hold the
"card" in their hands, everyone who had seen a demonstration of
the Peltier Effect refused – in our materials science lexicon,
Peltier materials get very cold on one surface but demonstrate
compensating heat on the opposing side. So when the demonstrator
disconnected the card and held it in his hand, everyone who
thought they knew what was happening gasped. With a digital
thermometer, the demonstrator measured the surface temperature of
the opposing side of the card – it was 72 degrees F. The top
surface of the card was -68 degrees F. It was extracting heat from
the local address and dissipating it non-locally in the presence
of a very small activating DC voltage field with sufficient
efficiency to freeze free-standing CO2 from the atmosphere.
In a different demonstration, IPMS scientists provided us with a
material they referred to as an "energy accumulator." In their
frame of reference, this material operated by capturing free
electrons and warehousing them in energy wells defined by the
upper and lower surfaces of a material they referred to as a
"one-dimensional" crystalline lattice. The lattice was made of
atomically engineered carbon, intercalated with atoms of other
materials, in a way that created a series of virtually
mono-molecular carbon films which were folded back and forth on
top of each other. When viewed under our electron microscope, this
material looked like an endless field of egg-carton peaks and
valleys. When the peaks from the lower layer were brought into
contact with the peaks from the upper layer, a virtual energy well
was created, within which electrons were reposed while waiting to
be directed elsewhere. This solid-state energy accumulator device
demonstrated an energy density 1.4 times greater than gasoline.
INEEL's report showed output results varying from 840-1024
watt-hours per
kilogram over extended tests.
When we submitted the six energy accumulator devices to INEEL and
DARPA for examination and analysis, an important discovery was
made. Scientists at INEEL weighed the battery containers [we sent
six Diehard battery containers to IPMS because they had no
containers to put their materials in] fully charged, they were
significantly more massive than when they were fully discharged.
Think about this carefully – this created a tremendous reaction
from DARPA. The US government attempted to classify and confiscate
these devices and would have succeeded except for the fact that
our attorneys succeeded in disabusing them from this course of
action by pointing out that this stuff belonged to another
government-owned laboratory in a foreign country. The implications
of this discovery are extremely important because this material,
manufactured in the presence of precisely modulated torsion
fields, proves that E does not equal MC squared. Never did. In
this instance, energy [as represented by nothing other than
electrons sitting still within the crystalline lattice of a
carbonized film] manifests itself as measurably massive while
sitting at rest. Again, Einstein was mistaken, and the Standard
Model (of physics) is wrong. In this case, E equals M with
no velocity at all...
LAMELLAR CRYSTALLINE MATERIAL AND A METHOD
OF ITS PREPARING
LAYERED CRYSTALLINE MATERIAL CAPABLE OF HIGH GUEST
LOADING
RU94039535
WO9308981
EP0662251
Inventor: TREFILOV V I // TOVSTJUK K D (+4)
FIELD: monocrystalline materials of high quality. SUBSTANCE:
lamellar monocrystalline material showing low defect level and the
corresponding distribution of impurities that allows to
intercalate at least 3 mole lithium into van der Waals channel per
one mole of crystalline material without significant crystalline
lattice distortion. Also, change of Gibbs free energy does not
depend of lithium concentration incorporation. Material is
prepared by the sequence stages. Ampoule is filled with
stoichiometric amount of chalcogenid element and bismuth under
nonoxidizing atmosphere and sealed. Then ampoule is heated to
temperature 5-10 C above of bismuth chalcogenid melting point and
cooled to the room temperature. Obtained polycrystalline bismuth
chalcogenid is contacted with seeding crystal with specific
structure of crystalline lattice. Obtained harmless nondefected
monocrystal of bismuth chalcogenid is cooled to the room
temperature. Some admixtures can be added to the prepared
crystalline material to obtain highly intercalated crystalline
material. Obtained crystalline material is used as active battery
member, thermoelectric device and capacitor. EFFECT: enhanced
quality of material.
Background of the Invention
The present invention relates to highly defect-free
monocrystalline materials capable of intercalating high levels of
guest species and a method of making the same. The present
invention further relates to a highly intercalated layered
crystalline material.
Layered crystalline materials (hosts) can accommodate foreign
species (guests) in the channels between the layers thereby
forming intercalated materials. Intercalation compounds, such as
graphite and transition metal chalcogenides, have been intensively
investigated over the last two decades and have found utility in a
number of fields, including batteries, photovoltaic cells,
superconductivity and hydrogen accumulation.
The hosts of interest to this application have anisotropic
lamellar structures separated by van der Waals channels which are
capable of accommodating small guest particles, such a lithium or
hydrogen.
Because of the weakness of a van der Waals attractive force, the
van der Waals channels can readily accept guest species, which can
be neutral or charged. The guest species fill the channel until no
more sites are energetically available. The amount of guest
species which occupy sites in the van der Waals channel is the
loading capacity of the guest. "Loading" or 'loading capacity" is
defined herein as moles guest species per mole host material;
species" is defined as ions or uncharged atoms of elements. It is
recognized that for many applications, increased loading capacity
of the guest into the layered material would significantly improve
device performance.
Distortion of a layered crystalline material has been used to
increase the channel width and thereby increase guest loading.
U.S.
4,288,508 reports a cathode active material for a battery having
the preferred formula This TiS2, where y is in the range of
0.15-0.20 and z can be as high as 3.25. However, increased loading
in these materials is accomplished by using the larger sodium atom
to pry open the van der Waals channels. This results in
significant distortion of the TiS2 lattice.
U.S. 4,309,491 reports a solid solution containing a bismuth
halcogenide for use as a cathode active material. The guest
loading process in the bismuth chalcogenide is reported to require
up to six
Faradays of electrons, suggesting that six moles of guest are
intercalated. However, it is also reported that there is
substantial dependence of the discharge voltage on the guest
concentration.
Additionally, there is no indication that the bismuth chalcogenide
has been prepared in a highly defect-free form with controlled
lattice parameters.
Accordingly, it is the object of the present invention to provide
a mono-crystalline material capable of intercalating extremely
high loads of a guest species in which a change in the Gibbs free
energy (AG) of the material is substantially independent of
intercalant concentration.
Under these conditions, properties dependent upon AG, such as
working potential of an electrochemical cell, remain unchanged.
It is a further object of the invention, to provide a highly
intercalated crystalline material having controlled lattice
parameters.
It is yet a further object of the invention to provide a method of
making a highly defect-free mono-crystalline material with
controlled lattice parameters capable of high guest loading.
Summary of the Invention
The present invention overcomes the limitations of the prior art
by providing a highly defect-free material with controlled lattice
characteristics. When used in devices such as a battery it
provides superior performance over prior art devices.
In one aspect of the invention, a layered mono-crystalline
material is provided having a defect density which is sufficiently
low to permit intercalation of at least 3 moles of lithium within
van der Waals channels per one mole of the material without
significant distortion of the lattice. The material is further
characterized in that its change in Gibbs free energy is
substantially independent of the lithium intercalation
concentration.
In another aspect of the present invention, a mono-crystalline
material having the formula, MeyChz, is provided where Me is
selected from the group consisting of Bi and Sb, Ch is selected
from the group consisting of Te, Se and S, y is 1 or 2 and z is 1,
2, or 3. The material has a defect density which is sufficiently
low to permit intercalation of at least 3 moles of lithium within
van der Waals channels per one mole of the material without
significant distortion of the lattice. The material is further
characterized in that AG is substantially independent of the
lithium intercalation concentration.Further detail concerning
intercalation compounds and devices using these compounds are
given in the following applications, filed on equal date as
"Layered Crystalline Material Capable of High Guest Loading", and
incorporated herein by reference: "Energy Storage Device",
"Electrolytic Double Layer Capacitor", and "Capacitive
Thermoelectric Device.
In preferred embodiments, the material has a hexagonal crystal
lattice structure, a defect density of less than 10'2/elm3 and a
gradient of impurity defect distribution in the van der Waals
channel inversely proportional to the direction of lithium
intercalation. The monocrystalline materials can be further
characterized in that a condensation of lithium occurs at a
loading capacity of approximately three. The condensation is from
a lattice gas to a quasi-liquid. The lattice structure may be
rhombohedral or hexagonal. The monocrystalline material is
preferably a single crystal. In preferred embodiments, the defect
density is minimized and perfection of the lattice crystal is
accomplished by using careful processing controls.In other
preferred embodiments, the mono-crystalline material is used in a
battery, a capacitor or a thermal electric device; although the
monocrystalline material may be ground into a powder for some
device applications.
In another aspect of the invention, a method of preparing a highly
purified bismuth chalcogenide consists of the following steps: an
ampoule is charged with stoichiometric quantities of a
chalcogenide element and bismuth; the ampoule is provided with an
atmosphere selected to prevent oxidation and sealed; the sealed
ampoule is heated at a temperature in the range of 5"C to 10 C
above Tijq of the bismuth chalcogenide, the temperature is
controlled to within a range of +0.5 along the length of the
ampoule and for a time sufficient to melt the component materials
and react to form the bismuth chalcogenide, whereby the ampoule is
agitated during heating to ensure homogeneous mixing of the
component materials; the material is cooled to room temperature at
a controlled rate to form a homogeneous polycrystalline bismuth
chalcogenide; the polycrystalline bismuth chalcogenide is placed
in surface contact with a seed crystal of a specific crystal
lattice structure; the seed crystal and polycrystalline bismuth
chalcogenide are heated to a temperature which is in the range of
30"C to 400C below This of the bismuth chalcogenide; a zone of the
polycrystalline bismuth chalcogenide adjacent to the seed crystal
is heated to a temperature which is in the range of 0 C to 150C
above Tljq of the bismuth chalcogenide; the zone is moved along
the length of the polycrystalline chalcogenide at rate in the
range of 2 to 10 mm/Er, whereby a single crystal highly
defect-free bismuth chalcogenide is formed; and the single crystal
bismuth chalcogenide is cooled to room temperature at the
controlled cooling rate.
In another aspect of the present invention, a highly intercalated
crystalline material is provided having a guest capacity in the
range of three to ten moles within van der Waals channels per one
mole of said intercalated material without significant distortion
of the lattice. The guest selected from the group consisting of
Group IA and Group IIA metals. The intercalated material is
further characterized in that AG is substantially independent of
the guest concentration. The intercalated material may have the
formula, GxMeyChz, where G is selected from the group consisting
of Group IA and Group IIA metals, Me is selected from the group
consisting of Bi and Sb, Ch is selected from the group consisting
of Te, Se and S, xis in the range of 3 to 10, yis 1 or 2 and z is
in the range of 1 to 3.
Brief Description of the Drawing
In the Drawing;
Figure 1 is a schematic illustration of the localized sites
in the van der Waals channels for the crystal lattice structures
used in the present invention;
Figure 2 is a cross-sectional schematic illustration of the
zonerefinement apparatus used in preparing single crystals of
the present invention; and
Figure 3 is a discharge curve of a battery using the
crystalline material of the present invention.
Description of the Preferred Embodiment
The present invention has identified that highly defect-free
crystalline layered materials with appropriate impurity
distribution are capable of intercalating high loads of guest
species into van der Waals channels of the material.
Structure. A family of highly defect-free compounds of the
formula, BiyChz, where Ch is Te, Se or S, y is 1 or 2 and z is in
the range of 1 to 3, have been identified which permit extremely
high loading capacity of the guest species, well beyond the
loading capacity conventionally predicted by the lattice structure
of the crystal and the model of the lattice gas. Solid solutions
of these compounds, i.e., Bi2(Tel.xSex)3, are also within the
scope of the invention. Importantly, high loading is achieved
without significant distortion of the crystal lattice and without
significant dependence of AG of the material on the intercalant
concentration. AG has been correlated with the operating
performance of the crystalline material when used in devices such
as a cathode material in a galvanic cell.
Although discussions are directed to a bismuth chalcogenide, it is
contemplated that any layered material of requisite crystalline
lattice parameters, guest loading capacity and thermodynamic
behavior is within the scope of the present invention.
The bismuth chalcogenide family is known to crystallize in
rhombohedral and hexagonal lattices. The hexagonal and
rhombohedral crystal lattices possess two types of energetically
accessible sites which permit Iocalization of the guest species
within the van der Waals channel. The basis for this observation
has been presented in a co-pending application U.S.S.N. 07/784,525
of which this application is a continuation-in-part and which is
herein incorporated by reference.
Figure 1 is a schematic representation of the two types of guest
sites. A first site 22 is in the plane of the center of the
channel, while a remaining site 24 localizes the guest species
along walls 26 of the channel Total loading of the channel by
guest is predicted to be three.
Occupation of sites 22 is more energetically favorable at the
beginning of intercalation than of sites 24. However, relative
energy levels change during the intercalation process. All sites
are sufficiently close in energy that "hopping" of guests from one
to another site of differing energy is possible. The guest species
behave as a 'lattice gas".
The conventional model would seem to suggest, therefore, that the
upper limit to guest loading without distortion of the lattice is
three. However, we have discovered that much higher loading is
possible For the specified lattice types shown in Fig. 1, orbital
interaction in a filled van der Waals channel results in increased
guestguest interaction and a decrease in the average guest-guest
interatomic distance. This conversion from occupation of localized
energy minima to free movement throughout the van der Waals
channel is equivalent to a phase change. The lattice gas condenses
into a high density state, which is defined herein as a
"quasi-liquid phase".
Because the new phase has a smaller average interatomic distance,
additional guests can be introduced without distortion of the
crystal lattice. Hence, a loading capacity of three is no longer a
limitation to the system and rapid and high levels of guest
loading is now possible. Loading capacity of lithium of up to
eight and nine have been observed in the bismuth chalcogenide
compounds of this invention.
We estimate that the loading capacity in this system can be even
higher, in particular, capacity of up to ten is considered
possible.
The class of compounds of the present invention has stable
crystalline phases of hexagonal or rhombohedral symmetry which can
be prepared with minimal defect densities and the appropriate
impurity distribution. It is known in the prior art that the
Bi2Ch3 class of compounds may crystallize in a rhombohedral unit
cell of space group D%s (R3m, at=9.83 ; a=24.4" for bismuth
selenide) containing five atoms. This crystal structure consists
of layers formed by equal atoms in hexagonal arrangement. It is
also given in prior art that a hexagonal unit cell for bismuth
selenide (at=4.14 ; cho=28.55 ) also has been identified.
In a battery, the discharge curve is directly correlated to AG of
the cathode material (a bismuth chalcogenide). The following
thermodynamic parameters which are related to AG must be
considered when evaluating a guest/host combination: the entropy
of distribution of the host/guest atoms, the energy of guest-guest
and guest-host interactions, the change in the Fermi energy (AFe),
and the lattice distortion (LD)-
The lattice gas to quasi-liquid condensation of the system
prevents significant distortion of the lattice. In the present
case, loading over the range of intercalation from 0 to 8 or 9
results in distortion only in the range of 2-3%. Such distortion
does not contribute significantly to the Gibbs free energy of the
system. In the invention, distortion is held not exceed 10%.In
contrast, in prior art TiS2 intercalation of Lithium, the c-axis
of the intercalated LiXTiS2, i.e., the axis perpendicular to the
intercalated van der Waals channel, has been shown to increase by
10% in response to as little intercalation as x=O to s=1. The
change in entropy (AS) is significant only in the early stages of
the intercalation process. AS is therefore very small over the
course of the process and need not be considered in the Gibbs free
energy equation.
The characteristics of the crystal lattice have a great effect on
the remaining two thermodynamic parameters, however. The energy of
interaction, SDt7 is a measurement of guest-guest and guest-host
interactions. Both of these are greatly affected by lattice
crystalline characteristics. If the crystal lattice contains
significant levels of defects and/or dislocations or has
sufficiently uneven distribution of deflects, the energy minima
associated with the localized sites will be disrupted and filling
is not uniform along the length of the channel.
Fermi energy level of the crystal is also effected by the
interstitial and lattice site impurities and the lattice
structure. The defect or impurity distribution is important in
identifying acceptable crystalline purity. If all defects are
clustered near the entrance to van der Waals channels, no guests
can enter and guest capacity is low even though crystalline
lattice purity is high. It is apparent therefore, that careful
crystal growth is important to preparing layered crystalline
materials capable of the high loading of the present invention.
Process
The following detailed description is presented to provide
details of the crystal growth process providing highly defect-free
layered crystalline materials with the specific lattice
characteristics, such as defect distribution, of the present
invention. The description which follows is for the bismuth
chalcogenide family; however, it is contemplated that any layered
material of requisite crystalline lattice parameters, guest
loading capacity and thermodynamic behavior is within the scope of
the present invention.
Stoichiometric quantities of highly purified (99.9999% pure)
bismuth and chalcogenide are charged into a quartz ampoule. If
necessary, the materials are zone refined before use.
Off-stoichiometry results in an n- or p-doped material with
characteristic degradation of the lattice structure and the
associated performance. The ampoule is evacuated to 10 7 mmHg and
backfilled to a pressure of 10 mmHg with a small amount of inert
gas, such as argon, or a reducing gas, such as hydrogen (3-10
cycles), and then sealed. Hydrogen is particularly preferred
because it reacts with oxygen during processing to prevent
oxidation and decrease the segregation of chalcogenide by reducing
its vapor pressure.
A highly homogeneous polycrystalline material is prepared in a
first processing step. The sealed ampoule is placed in a furnace
at room temperature and heated to a temperature 5-100C above its
melting point. The ramp rate, temperature and reaction time are
selected for the final compound. The reaction conditions are
listed in Table I for the preparation of polycrystalline Bi2S3,
Bi2Se3, and Bi2Te3. The temperature of the furnace over the entire
length of the ampoule is controlled to within +0.5 C. Careful and
accurate control of the temperature is important because of the
high volatility of chalcogenides.
Temperature variation along the ampoule length causes segregation
of chalcogenide which leads to off-stoichiometry. To optimize the
temperature control along the length of the ampoule, a long
furnace can be used. Additional heating coils can be used at
furnace ends to reduce the temperature gradient at the furnace
exits.
Table I -- Processing conditions for polycrystalline material.
processing conditions Bi2Te3 Bi2Se3 Bi2S3 heating rate to Tllq
("C/h) 30 20 15 exposure time (h) 10 15 20 at Tug + z + 10 C
cooling rate ( C/h) 50 40 - 35
During the last hour of reaction time, the ampoule is agitated or
vibrated to insure complete mixing of the ampoule components. The
ampoule vibration preferably is in the range of 25-100 Hz and is
accomplished by fixing one end of the ampoule to an oscillation
source.
Any conventional vibration means is contemplated by the present
invention. After reaction is complete, the ampoule is cooled at a
slow controlled rate.
Once a homogeneous polycrystalline material is obtained, it can be
further processed into a highly defect-free bismuth chalcogenide
single crystal. Any known method of growing single crystals can be
used, such as Bridgeman techniques, Czolchralski process and zone
refinement techniques (recrystallization). In particular zone
refinement has proved to be highly effective in obtaining high
purity single crystals.
Referring to Fig. 2, zone refinement is carried out in a quartz
boat 40 containing a seed crystal 42 of the desired lattice
structure. It is recommended that clean rooms levels of Class 100
be maintained.
The seed crystal 42 is oriented in the boat such that crystal
layers 43 are horizontal. The entire apparatus should be
shock-mounted to insulate against environmental vibrations. The
boule 44 of polycrystalline material is positioned in surface
contact with the seed crystal.
The furnace comprise two parts, an outer furnace 46 for
maintaining an elevated temperature along the entire boule length
and a narrow zone 47 movable in the direction of arrow 48 for
heating a small portion of the polycrystalline material. For
production of hexagonal structure, the outer furnace 46 is
maintained at 35"C below the melting point, and the zone 47, which
is 2-3 cm in length, is held at 10 C above the melting point of
the polycrystalline material. Unlike for the preparation of the
polycrystalline material int he first processing step, the boule
can in this step be rapidly heated to the operating temperature.
The zone is initially positioned at the seed crystal/boule
interface and this region is heated to the melting point of the
material.
The zone 47 is then moved slowly down the length of the boule.
Zone travel rate is selected according to the particular
composition and recommended rates are shown, along with other
processing parameters, in Table II. Zone travel rate is an
important processing parameter. If the rate is too great,
crystallization is incomplete and defects are formed. If the rate
is too slow, layer distortions result. The lower portion of the
heat-treated boule in contact with the quartz boat is preferably
removed before use. The process produces a single crystalline
material having less than 1012/cm3 defect density and an impurity
distribution which is inversely proportional to the intended
direction of intercalation. The single crystal typically contains
106 layers/mm with a spacing of 3-4 A/layer.
Table II. Processing conditions for hexagonal single crystal
growth
processing conditions Bi2Te3 Bi2Se3 Bi2S3 r boule temperature
Mp - 350C Mp - 350C Mp 35"C zone temperature Mp + 10 C Mp + 10 C
Mp + 10 C zone travel rate 8 mm/hr 6 mm/hr 3 mm/hr cooling rate 50
"C/hr 400C/hr 35 C/hr
The above process can be modified slightly to produce crystals of
rhombohedral structure, in which case a rhombohedral seed crystal
is employed in the zone refinement process.In addition, to produce
rhombohedral crystals, the furnace temperature is held at 300C
below the melting point and the zone is maintained at the melting
point of the p olycrystalline material.
Depending on the composition of the material, there is a
preference for either hexagonal or rhombohedral lattice structure.
This is summarized below in Table III.
Table III -- Preferred lattice structure for bismuth
chalcogenide.
lattice structure Bi2Te3 Bi2Se3 Bi2S3 rhombohedral x hexagonal X X
The above process provides a highly defect-free single crystalline
material. The crystal can be further ground into particles for use
in devices and each such particle is a mono-crystal. A grinding
technique is selected so as not to introduce many defects and
dislocations into the crystal. However, because of the weakness of
the van der Waals attractive force, the crystal cleaves readily
along the length of the channel without much danger of lattice
distortion.
Once formed, the material is tested by introducing it as the
cathode-active material into a galvanic cell. The use of highly
intercalated crystalline materials in an energy storage cell is
disclosed in a co-pending U.S. application entitled "Energy
Storage System" which is being filed this date. A standard battery
is constructed using a lithium anode, a non-aqueous Lilo4
electrolyte solution and the test material as the cathode. The
amount of lithium that can be introduced into the van der Waals
layer is determined by monitoring the moles of Faraday electrons
passed through an external circuit during intercalation. A typical
discharge curve 50 using a bismuth chalcogenide cathode prepared
according to the invention is shown in Fig. 3.An acceptable
crystalline material is capable of intercalating at least three
mole of lithium per mole of bismuth chalcogenide and has discharge
curve that is essentially flat, that is, a change of no more than
0.1-0.3 V is observed over an intercalation capacity range of 0.4
to 8 moles lithium. The flatness of the curve is an indication of
the substantial independence of Gibbs free energy change on guest
concentration.
Condensation of a lattice gas to a quasi-liquid manifests itself
in the discharge curve as a sudden change in the discharge
voltage. The actual change in voltage is quite small, however, and
is not significant to operation of the cell. Fig. 3 illustrates
the smooth, flat discharge curve. In an enlarged portion 52 of the
curve at approximately a guest load of three it is possible to
observe a "blip" in the curve. This is observable under carefully
controlled conditions.
Once a highly defect free crystalline material is prepared as
described above, it can be intercalated to obtain the highly
intercalated crystalline material of the present invention.
Intercalation can be carried out using conventional methods, such
as exposing the crystalline material to the vapor phase of the
intercalant or placing the crystalline material in a liquid that
contains the intercalant or passing a current through an
electrochemical cell where the crystalline material is an
electroactive material in one of the electrodes. The preferred
method for achieving high load of intercalant is the
electrochemical method.
WO9309570
CAPACITIVE THERMOELECTRIC DEVICE
Also published as: MX9206260 (A)
EP0610370 (A1) CA2122448 (A1) AU2908192 (A)
TOVSTJUK KORNEI D [UA]
GRIGORTCHAK IVAN I
A thermoelectric device for cooling a mass; the device comprising
a capacitor having two electrodes and being in thermal contact
with the mass to be cooled. The capacitor produces a cooling
effect when it is repeatedly isothermally charged and
adiabatically discharged.
Background of the Invention
This invention relates to solid state thermoelectric devices, and
particularly relates to thermoelectric device materials.
Conventional solid state thermoelectric devices operate based on
the Peltier effect, which is achieved by passing an electric
current through a junction of dissimilar metals. Such a device is
typically constructed from two semiconductor blocks, one being a
heavily doped n-type material and the other being a heavily doped
ptype material. The blocks are connected electrically in series
and thermally in parallel. In this arrangement, heat is absorbed
at a socalled cold junction of the semiconductor blocks and is
transferred to a so-called hot junction at a rate proportional to
the current passed through the semiconductor blocks. When the
current is applied in series with the n-type and p-type blocks,
electrons pass from a low energy level in the p-type material to a
higher energy level in the n-type material.This diode-like action
causes heat to be removed from the cold junction of the two blocks
and pumped through the blocks (in parallel) to the hot junction.
Bismuth telluride is currently the most popular semiconducting
material used for Peltier effect thermoelectric devices. It
exhibits high mechanical strength, high electrical conductivity,
and low thermal conductivity, three desirable characteristics for
a thermoelectric device. Commercially manufactured bismuth
telluride Peltier devices can achieve temperature differentials of
approximately 650C, and can pump tens of watts of heat.
Summary of the Invention
In general, in one aspect, the invention features a thermoelectric
device comprising two electrodes separated by an electrolyte. Each
of the electrodes comprises a crystalline material characterized
by the presence of van der Waals channels, the van der Waals
channels being capable of accommodating the electrolyte within the
channels to form a double layer of charge at interfaces of the van
der Waals channels and the electrolyte when a voltage is applied
between the two electrodes. The thermoelectric device exhibits a
temperature decrease in a two-stage cooling process comprising
application of a voltage between the electrodes to thereby form
the double layer and replacement of the voltage with a load
through which the double layer is discharged.Using selected
materials, the thermoelectric device of the invention exhibits a
0.5 C temperature decrease for each two-stage cooling process
repetition, and thus provides a significant thermoelectric effect.
Further detailed descriptions of compounds having van der Waals
channels and devices which utilize these compounds are provided in
the following applications, all filed of equal date as
"Electrolytic Double Layer Capacitor", and hereby incorporated by
reference: "Capacitive Thermoelectric Device" and "Energy Storage
Device".
In preferred embodiments, the voltage application is controlled to
charge said double layer isothermally and discharge the double
layer adiabatically.
Preferably, the crystalline material is a bismuth chalcogenide,
and most preferably, each of the two electrodes comprises a
monocrystal of the bismuth chalcogenide. In other preferred
embodiments, the two electrodes each comprise monocrystalline
powder particles of the crystalline material. The van der Waals
channels of the crystalline material are adapted to accommodate
the electrolyte by a training process comprising intercalation of
electrolyte into the channels.
Preferably the intercalation is produced by a training voltage
sufficiently high as to achieve electrolyte penetration of the van
der Waals channels, and most preferably, the training voltage is
periodically reversed in polarity between the electrodes.
In general, in another aspe ct, the invention provides a
thermoelectric device for cooling a mass, the device comprising a
capacitor having two electrodes and being thermally coupled to the
mass, the capacitor providing a cooling effect when it is
repeatedly isothemlly charged and adiabatically discharged.
Preferably, the capacitor is a double layer capacitor, and more
preferably, the capacitor is an electrolytic capacitor.
In general, in another aspect, the invention provides a
thermoelectric device comprising two electrodes separated by an
electrolyte, each electrode comprising a porous material capable
of forming a double layer of charge at interfaces of the porous
material and the electrolyte when a voltage is applied between the
two electrodes. The device exhibits a temperature decrease in a
two stage cooling process comprising application of a voltage
between the electrodes to thereby form the double layer and
replacement of the voltage with a load through which the double
layer is discharged.
In preferred embodiments, the porous material comprises a compound
of bismuth chalcogenide, activated carbon, and heat-treated
graphite, and preferably, the electrolyte comprises sulphuric
acid. Preferably, the voltage application is controlled to charge
said double layer isothermally and discharge the double layer
adiabatically.
The thermoelectric device of the invention exhibits an accumulated
temperature decrease produced by repetitions of a two-stage
cooling process, namely charging and discharging. Its compact
structure and elegantly simple operation provide significant
advantages over conventional thermoelectric devices. Other
features and advantages of the invention will become apparent from
the following description, and from the claims.
Brief Descrintion of the Drawing
Fig. 1 is a schematic illustration of one embodiment of the
thermoelectric device of the invention;
Fig. 2A is a schematic illustration of the device of Fig. 1
at a first stage of training;
Fig. 2B is a schematic illustration of the device of Fig.
2A at a later stage of training;
Fig. 2C is a schematic illustration of the device of Fig.
2A at a final stage of training;
Fig. 2D is a schematic illustration of the device of Fig.
2A including the formation of a double layer of charge; and
Fig 3 is a diagram of an electrical circuit for operating
the thermoelectric device of the invention.
Description of the Preferred Embodiment
We first present a discussion of the operational theory of the
thermoelectric device of the invention. The thermoelectric device
of the invention is a capacitive device characterized by the
ability to accommodate a very high charge density, and
correspondingly high energy storage, and very low internal
resistance. The capacitor thereby achieves very high discharge
power, and in fact, a discharge rate which is so fast as to be
energetically adiabatic.
Furthermore, very little resistive, or joule, heating occurs
during the discharge process. As will be explained further below,
these characteristics of the discharge process are so pronounced
as to provide a cooling effect via the following device operation.
The capacitive device is first isothermally "charged" to a very
high charge density, thus in an isothermal manner, whereby the
entropy of the device is decreased The capacitive device is then
adiabatically discharged, whereby the entropy of the device is
increased, necessarily resulting in a temperature decrease, or
cooling, of the device. The charge/discharge cycle may thus be
understood as a classical Carnot cycle, in which the cycle
temperature is directly related to the cycle kinetics and changes
in entropy.
The inventors herein have recognized that while theoretically, any
capacitive structure is capable of thermoelectric cooling,
particular capacitive schemes and particular device materials are
best-suited for achieving thermoelectric cooling. Based on the
operational theory explained above, a capacitive cooling device
ideally comprises a capacitive structure capable of very high
charge density accumulation and very low internal resistance; in
particular, the resistance of the capacitor electrodes ideally is
held low. Given these criteria, electrolytic double layer
capacitors, known to be capable of quite high charge
accommodation, have been identified as providing a superior
capacitive structure for a cooling device. Accordingly, the
cooling device of the invention is based on a double layer
capacitive structure.
As an example of the charge density accumulation limitations of
capacitors, the capacitance of a typical parallel plate capacitor
is given by: analyze the operational electrical properties of this
structure, consider first
C = where vg is a constant, 6 is the dielectric constant of the
medium between the capacitor electrodes, S is the surface area of
the capacitor electrodes, and d is the width of the medium
separating the electrodes. The charge density accommodation, i.e.,
the capacitance, of a given capacitor is thus limited by the
geometry, i.e., the surface area, the electrode spacing, the
material properties of the electrodes, and the medium separating
them.
The definition of capacitance for a double layer capacitor is
further specified by the structure of the charged double layer and
its geometry. This double layer comprises charge accumulation on
the electrode surface and accumulation of ions at the electrode
surface-electrolyte interface. Thus, for double layer electrolytic
capacitors, the width d in the capacitance equation is given by
the distance between the centers of the two regions constituting
the double layer. This distance is on the order of angstroms,
thereby providing a very large capacitance value for a given
capacitor surface area.
The capacitive cooling device of the invention provides an even
greater increase in capacitance (and charge density accommodation)
by providing an increase in surface area of the capacitor
electrodes over conventional double layer electrodes, and through
proper selection of the electrode material and the electrolyte.
Furthermore, as explained in detail below, the selected electrode
materials and electrolytes provide a dramatically low internal
resistance, a parameter which is critical to the cooling device
operation.
In the capacitive cooling device of the invention, increased
electrode surface area is obtained using a particular class of
materials, namely intercalation compounds, which are characterized
by a layered crystalline structure. The crystal layers of
intercalation compounds comprise planes of molecules or atoms
which are weakly bound together and separated from each other by
van der
Waals regions. These van der Waals regions form anisotropic
channels in the crystal lattice between the planes of molecules or
atoms, resulting, in effect, in a atwo dimensional" crystal
structure. Intercalation materials typically exhibit on the order
of 106-107 layers per millimeter of material thickness.Due to the
weak van der Waals force between the crystal layers, the lattice
channels can accommodate the physical introduction, or so-called
intercalation, of a guest intercalant species into them.
The inventors herein have recognized that a particular type of
intercalation compound, namely bismuth chalcongenides, including
Bi2Te, and Bi2Se3, are particularly well-suited for providing van
der Waals channels as an extension of electrode surface area.
Electrodes composed of these materials, when used in combination
with a suitable electrolyte, generate a highly uniform double
layer of a desirable structure.As is well-known to those skilled
in the art, bismuth chalcongenides exhibit a layered crystalline
lattice which is layered at the molecular level, each layer being
separated by a van der Waals channel having a width on the order
of 3-4 A. Further material properties of bismuth chalcogenides are
given in the copending United States Patent Application entitled
layered Crystalline Material Capable of High Guest Loading,"
herein incorporated by reference, being filed on the same day as
the present application.Of the materials surveyed, the inventors
have found that of the bismuth chalcogenides, Bi2Te3 exhibits the
best electrical conductivity, and correspondingly, the lowest
resistance, and is thus most preferable as an electrode material,
while Bi2Se3 exhibits a lower conductivity, and thus is less
preferable as an electrode material.
It must be emphasized that while the bismuth chalcogenides are
understood to provide superior electrical properties, other
intercalation materials may be employed in the capacitive cooling
device of the invention, and materials characterized by other
crystal structures which provide high charge density may also be
utilized as an electrode material. For example, activated carbon,
a porous material, may also be utilized as an electrode material;
the porous nature of activated carbon enhances the material's
effective surface area.
In one embodiment of the capacitive cooling device of the
invention employing intercalation electrode materials, the van der
Waals regions of the electrode material are employed such that the
surfaces of the crystal lattice channels, although internal to the
electrode material, contribute to the overall electrode surface
area, and thereby dramatically increase the effective electrode
surface area beyond that of its macroscopic surface. As described
in detail below, surfaces of the van der Waals channels of the
electrode material are capable of forming a double layer with an
electrolyte in the same manner as the electrode macroscopic
surface forms a double layer.Recognition and exploitation of this
physical process has enabled the inventors herein to achieve the
significant cooling capability in the cooling device of the
invention as a result of increased charge density accommodation.
Depending on the intercalation electrode material and the
electrolyte selected for the cooling device, the van der Waals
channels of the electrodes may need to be manipulated, or
"trained" to effectively accommodate the electrolyte within them.
The condition for this requirement is based on the structural
dimensions of the van der Waals channels and the solvated complex
radius of the electrolyte's solvated ions. If the complex radius
of the solvated ions is larger than the width of the van der Waals
channels, then the electrolyte will not be able to penetrate the
channels and no double layer will be formed within the channels.
Accordingly, a material having van der Waals channel widths which
are less than the solvated ionic radius must be trained to
accommodate the larger ions, and thereby trained to accommodate
the electrolyte itself. The van der Waals channel width of bismuth
chalcogenides is too narrow for electrolytes of interest to
penetrate them, and thus a training" of bismuth chalcogenide is
required. A detailed training sequence is described below.
Electrode materials, like activated carbon, which are not
intercalation compounds, do not require such a training process,
because they do not contain van der Waals regions. As explained
above, activated carbon provides an enhanced surface area with the
surfaces of its internal pores, which accommodate electrolyte to
form a double layer of charge.
The charge density capacity and the internal resistance of
electrode materials, and particularly intercalation materials, are
dramatically impacted by the purity and defect density of the
chosen material. This is manifested in the degree of ability to
manipulate van der Waals channels to increase electrode surface
area Impurities and crystal lattice defects distort the geometry,
as well as the field characteristics, of the van der Waals
channels, rendering them less accessible to intercalating species,
degrading the channel surface structure and thus degrading the
electrical and mechanical properties of the channels.
Accordingly, it is ideally preferred that the material chosen for
the capacitor electrodes be prepared using unique processes,
developed by the inventors herein, yielding a highly pure and as
defecbfree as possible material. To that end, the following single
crystal growth process is preferred for bismuth chalcogenide
materials. Alternative processes, providing less than ideally pure
and defectefree material, may nonetheless be acceptable for
particular cooling device applications. Those skilled in the art
will recognize critical material parameters and corresponding
performance results.
In the preferred intercalation compound preparation process,
stoichiometric quantities of highly purified (99.9999% pure)
bismuth and tellurium (or other selected chalcogenide) are first
charged into a quartz ampoule. If necessary, the materials are
zone refined before use. Off-stoichiometry results in an n- or
pdoped material with the resultant degradation of the lattice
structure and the associated performance. The ampoule is evacuated
to 10-7 minlig and barkfilled to a pressure of 104 mmHg with a
small amount of inert gas, such as argon, or a reducing gas, such
as hydrogen (3-10 cycles), and then sealed.Hydrogen is
particularly preferred because it reacts with oxygen during
processing to prevent oxidation and decrease the segregation of
chalcogenide by reducing its vapor pressure.
A highly homogeneous polycrystalline material is prepared in a
first processing step. The sealed ampoule is placed in a furnace
at room temperature and heated to a temperature 5-10 C above its
melting point. The ramp rate, temperature and reaction time are
dependent upon the final compound. The reaction conditions are
listed in Table I for the preparation of polycrystailine Bi2S3,
Bi2Se9, and Bi2Te3. The temperature of the furnace over the entire
length of the ampoule is controlled to within +0.5 C. Careful and
accurate control of the temperature is important because of the
high volatility of chalcogenides.
Temperature variations along the ampoule length causes segregation
of chalcogenide which leads to off-stoichiometry. To optimize the
temperature control along the length of the ampoule, a long
furnace can be used. Additional heating coils can be used at
furnace ends to reduce the temperature gradient at the furnace
exits.
Table I. Processing conditions for polycrystaline material.
processing conditions Bi9Teq Bi9Seq Bi9S3 heating rate to Tliq (
C/h) 30 20 15 exposure time (h) 10 15 20 at Tiq + 10 C cooling
rate ( C/h) 50 40 35
During the last hour of reaction time, the ampoule is agitated or
vibrated to insure complete mixing of the ampoule components. The
ampoule vibration is in the range of 25-100 Hz and is accomplished
by fixing one end of the ampoule to an oscillation source. Any
conventional vibration means is contemplated by the present
invention. After reaction is complete, the ampoule is cooled at a
slow controlled rate.
Once a homogeneous polycrystaline material is obtained, it can be
further processed into a highly defect-free bismuth chalcogenide
single crystal. Any known method of growing single crystals can be
used, such as Bridgeman techniques, Czolchralski process and zone
refinement (recrystallization). In particular zone refinement has
proved to be highly effective in obtaining high purity single
crystals.
Zone refinement is preferably carried out in a quartz boat
containing a seed crystal of the desired lattice structure, e.g.,
the hexagonal lattice structure.
It is recommended that clean rooms levels of Class 100 be
maintained The seed crystal is oriented in the boat such that
crystal layers are horizontal. The entire apparatus should be
shock-mounted to insulate against environmental vibrations. The
boule of polycrystalline material is positioned in surface contact
with the seed crystal.
The furnace comprises two parts, an outer furnace for maintaining
an elevated temperature along the entire boule length and a narrow
zone movable in a direction for heating a small portion of the
polycrystalline material. The outer flirnace is maintained at 350C
below the melting point and the zone, which is 2-3 Cm in length,
is held at 100C above the melting point of the polycrystalline
material. Unlike for the preparation of the polycrystalline
material, in the first processing step described above, the boule
can be rapidly heated to the operating temperature. The zone is
initially positioned at the seed crystal/boule interface and this
region is heated to the melting point of the material. The zone is
moved slowly down the length of the boule.Zone travel rate varies
with composition, and exemplary rates are shown, along with other
processing parameters, in Table IL Zone travel rate is an
important processing parameter. If it is too great,
crystallization is incomplete and defects are formed If it is too
slow, layer distortions result. The lower portion of the
heattreated boule in contact with the quartz boat is preferably
removed before use.
Table II. Processing conditions for hexagonal single crystal
growth.
processing conditions Bi2Te3 Bi2Se3 Bi2S3 boule temperature Mp-35
C Mp- 35 C Mp - 35 C zone temperature Mp+ 100C Mp + 10 C Mp + 10 C
zone travel rate 8 mm/hr 6 mm/hr 3 mm/hr cooling rate 50 C/hr 40
C/hr 35 C/hr
The above process can be modified slightly to produce crystals of
rhombohedral structure, in which case a rhombohedral seed crystal
is used in the zone refinement process. In addition, to obtain
rhombohedral crystals, the finance temperature is held at 300C
below the melting point and the zone is maintained at the melting
point of the polycrystalline material.
Preferably, a monocrystalline intercalation compound, and most
preferably, bismuth chalcogenide, is grown using the process
described above to produce monocrystalline electrode structures.
For example, as one embodiment of the invention, monocrystalline
bismuth chalcogenide electrodes are produced having a rectangular
geometry with sides of 4 millimeters-long and 5 millimeters-long,
and having a thickness of between 0.5-1 millimeters. It is
preferable to metalize one of the faces of the monocrystalline
material which is perpendicular to the plane of the van der Waals
channels within the crystal.
This metalization may consist of, for example, a nickel paste,
which is spread on the crystal to form a 10-20 micron-thick metal
layer. The metalization provides both a good electrical contact to
the crystalline piece and enhances the rigidity of the crystalline
piece.
Alternatively, the monocrystalline bismuth chalcogenide material
may be ground into a powder for forming the electrodes; such a
powdered material is more easily manipulated than the single
crystal material. The crystal grinding process may be carried out
using, for example, a ball milling device, or other grinding
device, to produce single crystal particles each having a diameter
of preferably approximately 70 microns. Other particle diameters
may be more preferable in specific instances. The crystal
particles are then mixed with an appropriate compound to bind them
together. While the binder acts, in effect, to "glue" the
particles together, it must not completely electrically insulate
the particles from each other. The binder material is selected
according to the electrolyte.When an aprotic electrolyte solvent
is used, the binder preferably consists of a 3% aqueous solution
of carboxymethylcellulose, in which the particles are mixed; for
other electrolytes, alternative binding agents, e.g., a 5%
polyethylene dispersion in normal hexane, may be used. The
resulting powderbinder mixture is placed into an electrode mold
and then dried at room temperature. The electrode geometry, as
determined by the mold, may be, for example, disc-shaped, as is
conventional for capacitors, with an electrode thickness of
between 0.3-1 millimeters. Alternative electrode geometries are
also feasible.
The grinding process described above produces some amount of
crystal damage, and corresponding crystal defects. However,
because of the weakness of the van der Waals attractive force
between the crystal layers of intercalation compounds, these
compounds cleave readily along the axis of the channels without
much danger of lattice damage or distortion.
The inventors herein have also developed a preferable process for
producing electrodes of material combinations of bismuth
chalcogenides, activated carbon, and heat treated graphite. In
this scheme, a bismuth chalcogenide, such as Bi2Te3 may be present
in the range of from 0 to 100%.
The activated carbon material (ACM) may also be present in the
range of 0 to 100% and the heat treated graphite (HTG) may be
present in the range of from O to 40% of the ultimate composition.
An electrode with higher performance but with higher cost will
include a higher proportion of the bismuth chalcogenide whereas an
electrode with lower performance and lower cost will include a
higher proportion of the ACM. The particular proportions chosen
will thus be based on a cost-performance analysis. The composition
is held together with a binder such as polytetrafluoroethylene
(teflon).
If the electrode is to include a bismuth chalcogenide such as
Bi2Te3, the process described above is employed to produce
monocrystalline powder particles. The starting material for the
ACM is a cellulose fiber. The cellulose fiber is heat treated at
800-950 C for one to two hours in an oxygen free environment.
Thereafter, it is activated in a steam atmosphere at 800-9000C for
two to three hours. The material is then crushed into particles
having diameters in the range of 4-8 mm and a length of 0.5 mm.
This material will have a specific surface area of 1300-2500 m2/g.
The heat treatment of the cellulose fiber material will result in
an 85-90% carbon content.
Production of the heat treated graphite (HUG) begins with
crystalline flake graphite having an ash content of not more than
2%. This material is ground and sorted to have a maximum diameter
of 200 pm. The particulate material is then heat-treated in an
electric furnace at a temperature in the range of 2200-2500 C in a
vacuum atmosphere. The preferred vacuum is 104 mmHg. The material
is maintained in the furnace for a time sufficient to reduce
residual ash content to less than 0.1%. After this heat treatment,
the powdered material is sifted in a vibration sifting device,
resulting in particles having a diameter in the range of 80-200
pm.
The selected binder material, for example,
polytetrafluoroethylene, is first processed in a mixer to obtain a
bulk volume of 3-5 cm2/g. The binder is added to the powder
material in a quantity not to exceed 20 wt% of the electrode
weight.
Once the starting materials are prepared, the following steps are
carried out to fabricate an ACM electrode. First, the monocrystal
bismuth chalcogenide powder, if any is to be included, the heat
treated graphite, and the teflon are put into a mixer and mixed
for 2-3 minutes at a speed of rotation not less than 4,000 rpm.
Thereafter the selected quantity of ACM is added and the mixing
process is continued for another 2-3 minutes at the same speed to
obtain a material having a bulk volume of 4.3-4.7 cm3/g. A
suitable material begins with 97% HTG and 3% teflon; ACM is then
added to provide 80% of the total weight.
This electrode material is then compressed onto a metallic
substrate in a hydraulic press with a compression pressure of
approximately 270 MPa. A suitable electrode size is 10 cm by 10 cm
by 0.1 cm. A suitable substrate material is perforated nickel foil
having holes whose diameter is in the range of 0.7-1.0 mm. The
distance between the holes is in the range of 0.6-0.8 mm.
Other perforation schemes are also acceptable. A preferred
thickness of the metallic substrate is 0.1 mm.
After the electrode composition is pressed onto the metallic
substrate, the resulting electrode is annealed for 1-2 hours at a
temperature of 100-140 C in a chamber evacuated to 10.1 mmRg.
After annealing, the electrode is impregnated with a suitable
electrolyte such as a 28-30% water solution of potassium
hydroxide. The electrode is immersed in the electrolyte at room
temperature under pressure for approximately 5-10 minutes.
Using a suitable electrode production process, including either of
the processes described above or another suitable process, the
capacitive cooling device of the invention is assembled into the
following scheme. Referring to Fig. 1, in the preferred device
configuration 60, two identical electrodes, most preferably being
bismuth chalcogenide electrodes 20, are separated by an
electrolyte 30. The electrolyte 30 suitably consists of an aqueous
solution of, e.g., alkali, or 1.0 M of LiClO4 in propylene
carbonate, using bismuth chalcogenide electrodes. In this case, a
separator, consisting of 2 layers of non woven polypropylene, each
layer 100 pm-thick, and saturated with the electrolyte, provides
mechanical support of the electrolyte.Alternatively, for various
electrode materials, the electrolyte may comprises a 1.2 M
solution of organic cation of perchlorate in a mixture of
propylene carbonate in dimethoxyethane, an aqueous solution of
potassium hydroxide, an aqueous solution of single valence metal
sulphates, or other aqueous solution. Using the LiClO4 propylene
carbonate electrolyte discussed above, a polypropylene separator
is suitably impregnated with the electrolyte solution and is
positioned between the electrodes 20. Because the separator
material adds to the overall internal resistance of the device,
the separator thickness should be minimized while at the same time
taking dependent device parameters into consideration.
The electrodes, held apart by the separator, are inserted into a
supporting frame (not shown) and sealed in a pressing fond, As
explained above, depending on the cooling device electrode
material and electrolyte, the material may need to be "trained";
in particular, some intercalation compounds must be trained to
allow the electrolyte to penetrate the van der Waals channels and
form a double layer of charge with the channels' 8surfaces.
Bismuth chalcogenides, while being preferred for their electrical
properties, are one type of intercalation material which requires
this training process. Accordingly, "training" is aprocess,
described below, whereby electrolyte (and ions) are driven within
the van der Waals channels to facilitate flow of electrolyte into
and out of the channels.While the process will be described for
this material, it must be recognized that the same procedure may
be applied to other materials.
Referring to Fig. 2A, there is shown a capacitive cooling device
60 having two bismuth chalcogenide electrodes 20a, 20b at the
start of the training process. The dimensions of the electrodes'
van der Waals channels 70a, 70b are greatly exaggerated for
clarity, and it must be recalled that each electrode is comprised
of on the order of 106-107 such channels. Between the two
electrodes is positioned a LiClO4-based electrolyte 30. During the
training process, the power supply 40 is set to provide a voltage
which is greater than the faraday potential for cation
intercalation, and thus the voltage depends directly on the
particular combination of device electrode material and
electrolyte employed.
Given a particularly chosen electrode-electrolyte combination,
those skilled in the art will recognize that the corresponding
faraday potential may be determined in a standard table of
material systems and faraday voltages.
At the start of the electrode training, when a voltage above the
faraday voltage is applied to the device, the electrode 20b
connected to the positive terminal of the power supply accumulates
a positive surface charge. The surfaces of the van der Waals
channels 70b of the electrode likewise accumulate this positive
surface charge. Correspondingly, both the macroscopic surface and
the surfaces of the van der Waals channels 70a of the electrode
20a connected to the negative terminal of the power supply
accumulate a negative surface charge.
In response to this surface charge configuration, free Li+ ions 72
readily intercalate the negatively charged electrode 20a, because
of the favorable charge and energy configuration, and because
their ionic radius is relatively smaller than the width of the van
der Waals channels. In addition, solvated Li+ complexes 74 move
toward the negatively charged electrode surface and solvated Cl04
complexes 76 move toward the positively charged electrode
surface.The positively charged electrode's van der Waals channels
70b, being 3-4 A-wide (as occurring before the training process)
are too small for the ClO4- complexes to penetrate within them;
the solvated Li' complexes, however, do to a small degree
penetrate the 3-4 A-wide channels 70a of the negatively charged
electrode 20a, effectively being transported along with the free
Li+ ions to the electrode surface and within the electrode
channels. As a result, the solvated Li+ complexes slightly widen
the channels that they partially enter in the negatively charged
electrode.
In order to cause the solvated Li+ complexes to penetrate the
opposite electrode 20b, the polarity of the power supply is
reversed. Then, the accumulated surface charge distribution
reverses; the previously positively charged electrode now
accumulates negative surface charge, and attracts the free Lif
ions 72 and solvated complexes 74. The free Lif ions 72 readily
intercalate the channels and the solvated complexes 74 again
partially enter the corresponding van der Waals channels, and
thereby slightly widen the channels.
Referring to Fig 2B, repetition of this process of voltage
polarity switching progressively widens the van der Waals channels
of each of the electrodes 20a, 20b. Throughout the process, the
voltage may be increased, depending on the initially applied
voltage, to thereby increase the attraction of the ions and
electrolyte to the van der Waals channels.At an intermediate point
in the training process, as depicted in the figure, the solvated
Li+ complexes 74, as well as the free Lil ions, will be able to
completely penetrate the widened channels 70b of the electrode
70b, which is shown to be currently negatively charged The
solvated ClO4 complexes, being of a larger size than the solvated
Li complexes, will not yet be able to completely penetrate the
channels of the currently positively charged electrode 70a,
however.
At the end of the training process period, referring to Fig. 2C,
both the solvated ClQ complexes 76 and the solvated Li+ complexes
74 are able to completely penetrate the van der Waals channels
70a, 70b, of both electrodes, 20a, 20b. As shown in Fig. 2'), at
this time, electrically neutral electrolyte (including both ClQ
complexes 76 and Li+ complexes 74) is thereby able to completely
penetrate the van der Waals channels and create an electric double
layer of charge 80, 82 and 84, 86 at the electrode-electrolyte
interface throughout the van der Waals channels of each electrode,
in a manner similar to that which occurs at the macroscopic
surface of the electrodes. This penetration of electrolyte
throughout the crystal channels forms the basis for achieving
dramatic charge density increases that result in the cooling
effect achieved by the invention.
The extent of training required to achieve penetration of the
electrolyte within the electrodes' van der Waals channels is
critically dependent on the particular combination of electrode
material and electrolyte employed. The width of the electrode van
der Waals channels before undergoing any training process and the
radius of the solvated complexes in the electrolyte determine the
training required; the larger the complex radius and the smaller
the van der Waals channels' width, the longer the training time
requirement. For the electrode material Bi2Te3 and an LiCl04-based
electrolyte, the training preferably consists of about 20 training
cycles of approximately 30 minutes each, where the polarity of the
power supply is reversed with each cycle. For specific capacitive
device requirements, this training may be adjusted, however.With
less training, a lower degree of electrolyte penetration within
the channels would be achieved, and a correspondingly lower double
layer capacitance would result. Thus, for achieving the maximum
possible capacitance of a given electrode, the training should be
maximized. Those skilled in the art will recognize that a
preferable training procedure may be empirically determined for a
given electrode-electrolyte combination and charge density
accommodation goal.
Alternative training processes are within the intended scope of
the invention. For example, the voltage polarity may be maintained
constant in the above process, or a charge-discharge process may
be employed to widen the van der Waals channels. In such a
process, a voltage above the faraday potential is applied between
the electrodes, in the manner discussed above, for a period of
time, and then the capacitor is discharged across an appropriate
load. If the voltage polarity is maintained constant during this
process, or if the voltage polarity is not switched during the
training process first described, one of the electrodes may not
achieve widened channels, depending on the electrode material and
electrolyte composition.For example, using Bi2Te3 electrodes and a
LiClO4-based electrolyte in a training procedure in which the
voltage polarity is constant, the electrode having the negative
polarity will be intercalated with free and solvated Li+ complex
(and thereby accommodate electrolyte), but the electrode of
positive polarity will not have the benefit of free Li+ ions and
complexes beginning to open its lattice channels, and thus the
solvated ClOd complexes will not widen those channels to
accommodate electrolyte; as a result, the electrode of positive
polarity will not provide the extended van der Waals surfaces.
Of particular importance is the fact that the training process
does not deform or distort the crystal planes of the layered
crystalline electrode material to any significant extent. The
extent of crystal plane deformation is related to the starting
purity and defect density of the electrode material, as well as
other properties resulting from the growth process; fewer initial
defects in the crystal result in fewer crystal plane deformation
sites caused by the training. With little or no crystalline plane
distortion at the end of training, the electrodes' van der Waals
channel surfaces are uniform and stable, and can correspondingly
charge and discharge the double layer in a short time period. In
addition, the internal resistance of the material is maintained
very low. These conditions provide for the adiabatic discharge
mechanism relied on by the cooling device of the invention.Also of
importance is the fact that the after the training process widens
the van der Waals channels to accommodate the electrolyte, the
channels do not later shrink to their original width.
It should be emphasized that alternative materials, like compounds
including activated carbon, are also suitable electrode materials
and do not require a training process
Referring now to Fig. 3, the cooling device of the invention is
operated in the following configuration. The capacitive device
structure 60 is thermally isolated from the ambient via a
calorimeter 35, or any suitable insulating container. The device
is connected in a parallel charging-discharging circuit via, for
example a switch 62. This circuit is external to the calorimeter
35. The charging circuit comprises a power supply 40 and an
electrical control component 64, e.g., a current limiter, for
limiting the speed with which the power supply charges the double
layer of the capacitive device.The discharging circuit comprises
an appropriate load 65, e.g., a wire, resistor, or other load
element. The load element is suitably selected based on the charge
density accumulation of the capacitive device to achieve the
highest possible discharge speed A thermocouple device 66 may be
positioned in proximity to the cooling device 60 to measure the
cooling effect. Such a thermocouple device might typically include
a meter 68 for indicating the cooling effect measurement.
In operation, the capacitive structure 60 is first connected to
the power supply via an appropriate control of the switch 62, at
which time the capacitive structure accommodates a charged double
layer. The current limiter 64 produces a "trickle charge" effect
and thereby controls the speed of the charging operation such that
it proceeds slowly enough for isothermal conditions to be
maintained at the device. A resistor or transistor-based device
may suitably be used as a current limiter. Once the capacitive
structure has accumulated a characteristic charge density, the
switch 62 is controlled to discharge the capacitive structure
across the load 65. Due to the very high charge density and very
low internal resistance of the capacitive structure, and using a
preferably low load resistance, the structure discharges at a
speed approaching adiabatic conditions.As a result, during the
discharge operation, the temperature of the capacitive structure
decreases. Repetition of the charge-discharge process results in
accumulation of this cooling effect.
Based on thermodynamic principles, the cooling mechanism results
from the adiabatic entropy increase produced when the capacitive
structure is discharged. As required by the second law of
thermodynamics, an adiabatic increase in entropy results in a
temperature decrease. The isothermal capacitive charging process
results in an ordering, and corresponding entropy decrease, which
is, in effect, released during the discharge process. Based on
this phenomena, it is recognized that electrode materials
exhibiting a high degree of order are more effective in the
cooling device than materials of lesser degrees of order. "Degree
of order is here meant to describe the impact of crystal purity,
defect density, uniformity, and other related structural and
electrical properties. For example, a monocrystalline electrode
structure is understood to provide a larger entropy change and
corresponding temperature decrease than a polyerystalline
electrode structure.
A BiaTe3, LiCl04-based cooling device of 20 mm in size has been
demonstrated to achieve a cooling effect of 0.5-0.7 C per
charge-discharge cycle (each cycle consists of one charging and
discharging process). This significant cooling effect is
cumulative as cycles are continued, and has been demonstrated to
proceed until the electrolyte froze. Preferably, each charge and
discharge phase of each cycle is given 1 second to complete.The
superior charge accommodation and low internal resistance of this
device are understood to enhance the cooling mechanism--the device
charge capacity is between 30-100 farads per cubic centimeter and
the device internal resistance approaches approximately 0.02
Q-cm2. This extremely low internal resistance provides the ability
to achieve high power in the capacitor discharge. Theoretically, a
monocrystalline capacitor structure of pure and defect-free
bismuth chalcogenide would exhibit 1000 farads per cubic
centimeter and would provide an even higher discharge rate.
It must be understood that the capacitive cooling device of the
invention may employ other materials and electrolytes and still
achieve a cooling effect; the device performance is, however,
effected by the particularly chosen combination of materials and
electrolytes. For example, a cooling device consisting of
activated carbon electrodes and, employing, e.g., sulphuric acid
as an electrolyte, while still achieving the cooling effect, is
somewhat less efficient than a device consisting of bismuth
chalcogenide electrodes.
Considering that the Bi2T#, liiClO4-based cooling device achieves
a degree of cooling which is great enough to freeze the
electrolyte, alternative, low freezing-point electrolyte systems
may be employed for appropriate electrode materials. For example,
in theory, the use of propylene carbonate, which has a freezing
point of -60 C, as an electrolyte would provide the ability to
achieve a greater degree of cooling.
The inventors herein have recognized that the cooling capability
provided by the capacitive cooling device of the invention may be
employed in a myriad of applications where a solid state cooling
device is preferable over a conventional condensation-tgpe cooling
device. Such applications are characterized by space, weight,
power, or material limitations (as in the case of replacements for
freon- based systems) and include cooling of, e.g., electronic
components, medical equipment, optical fiber systems, food
refrigeration devices, chemical analysis devices, and an expansive
variety of other systems.
Other embodiments of cooling device materials, training schemes,
modes of operation, and application are intended as included
within the spirit and scope of the invention.
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